Trace amounts of gaseous chemical contaminations in electronic clean rooms significantly impact chip manufacturing. To reduce the chip-making process for large-scale integrated circuits, monitor these contaminants becomes a pivotal step. Offer an overview of international, national standards and semiconductor roadmaps, regarding environmental requirements for electronic clean rooms and the potential threats various pollutants pose to chip manufacturing. The principles of the main methods used to measure trace gases in current electronic clean rooms were discussed, with particular focus on the lowest detection limits and sensitivity, based on previous research. The performance specifications of instruments from various manufacturers currently used for measurements have been summarized. Additionally, principal enhancement measures for improving the detection limit and sensitivity specific to different measurement methodologies have been proposed.