经由磁控溅射生长的金属薄膜，其电阻率是反映所选取薄膜材料性和性能评估的重要依据。为得到高精度的薄膜电阻率，采用由Pt制备的薄膜电阻进行测试研究，通过范德堡（Van der Pauw）函数的反演优化四线法设计了测试系统，采用交／直流四线方式在该系统上进行实验数据采集。实验结果表明：范德堡修正因子f可以匹配0.7以下的值，增大了系统测试的适用范围；直流四线法更容易受到失调电压和测试电流大小的影响，交流四线法的抗干扰能力优于直流四线法。为了评定系统测试的准确性，将交流四线法测量的结果与美国吉时利生产的Keithley-2400源表和Keithley-2182A纳伏表测量的结果进行对比，其相对误差小于1.92%，为精密薄膜制备的均匀性检测领域提供重要参考，具有实际的应用价值。

The resistivity of metal films grown by magnetron sputtering is one of the important parameters for evaluating and selecting material. In order to obtain high-precision value of film resistivity, Pt films were choosed for investigation, and the four-line method by inverting the Van Pauw function were optimized to design the test system, and the AC/DC four-line method was used to carry out the experimental data acquisition on this system. The experimental results show that the Van der Pauw correction factor f can match the value below 0.7, which expands the application range of the system test. DC four-wire method is found to be more susceptible to the influence of offset voltage and test current, and AC four-wire method has better anti-interference ability than DC four-wire method. In order to evaluate the accuracy of the system test, the results measured by AC four-wire method are compared with those measured by Keithley-2400 source meter and Keithley-2182A nanovolt-meter. The relative error is less than 1.92%. Our test system has practical application, which provides important reference for the uniformity detection of precision films.